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Instructions:
- With start runs a new deposition
- West slider to select the value of exponent eta
- East slider to select the value of constant c
Simulation of a correlated ballistic deposition in which particles
are deposited is a substrate of 200 sites. Each new particle is
selected (random number betwee 0 and 200), and the probability for
sticking to the previous particle is:
P=c d^(eta)
where d: is the distance from the new particle
to the last deposited particle.
eta: is and exponent and c a constant selected with the sliders.
See Landau and Paez Eq. 24.32 in section 24.18.